Diaphragm Valves for ALD and ALE

FITOK Diaphragm Valves for ALD and ALE are designed specifically for Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) applications, where precision, flow stability and minimal particle generation are essential. These processes deposit ultra-thin layers at atomic scale and are fundamental in advanced semiconductor manufacturing, where traditional technologies can no longer keep up with constantly shrinking node sizes. These valves are available in standard, thermal and thermal immersion models, operating at temperatures from 0 °C up to 220 °C depending on the model, and handle pressures from vacuum up to 10 bar (standard/thermal model) or up to 4.8 bar (thermal immersion model). To suit different installation layouts, they can be fitted with position sensors and swivel solenoid valves that make actuator adjustment easier, as well as bodies with ports for heater cartridges and thermocouples, offering maximum flexibility in complex systems. FITOK Diaphragm Valves ensure extremely precise gas delivery during the deposition process, offering reliable operation even in the most demanding conditions. Their advanced design provides an exceptional service life, ultra-fast response and a highly consistent Cv, ensuring stable performance in every cycle. Benefits:

• Ultra-long cycle life
• No dead spaces in the flow path
• High Cv consistency and stability
• Fast response: total opening/closing time below 15 ms
• Optional models: standard, thermal and thermal immersion
• Compatible with swivel solenoids for easy adjustment